A4 Conference proceedings

TiO2 thin films and doped TiO2 nanolaminates, their structure and its effect on their photocatalytic properties

Publication Details
Authors: Kääriäinen Marja-Leena, Kääriäinen Tommi, Cameron David
Publication year: 2007
Language: English
Start page: 157
End page: 161
JUFO-Level of this publication:
Open Access: Not an Open Access publication

Atomic Layer Deposition (ALD) has been used to deposit undoped, doped and nanolaminate structures based on titanium dioxide and the dependence of their photocatalytic activity on the film structure has been studied. The activity of undoped films has been found to reach its peak at a certain film thickness. The reason for this may be the quantum size effect. Titanium dioxide films have been also doped by transition metals and nitrogen. Nitrogen has proven to be the best dopant to increase the photocatalytic activity.

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Last updated on 2017-22-03 at 16:02